Abstract
This paper proposes a new atmospheric pressure plasma (APP) deposition system with direct-injection nozzle (modified-APPDS) for depositing the polyvinylidene fluoride (PVDF) thin film. In the modified-APPDS, the key parameters such as length of guide-tube, distance of bluff-body, gas composition, and gas flow rates are examined for generating glow-like intense plasma. As a result, the intense glow-like plasma generated broadly by the modified-APPDS can uniformly deposit the PVDF thin film, which is confirmed by field emission-scanning electron microscopy (FE-SEM) and Fourier transforms-infrared spectroscopy (FT-IR).
| Original language | English |
|---|---|
| Pages (from-to) | 125-133 |
| Number of pages | 9 |
| Journal | Molecular Crystals and Liquid Crystals |
| Volume | 733 |
| Issue number | 1 |
| DOIs | |
| State | Published - 2022 |
Keywords
- Atmospheric pressure
- direct-injection nozzle
- flexible optoelectronic device
- plasma deposition
- PVDF thin film