The characteristics of the asymmetric-offset structure n-type polycrystalline thin-film transistors fabricated by alternating magnetic-field-enhanced rapid thermal annealing

Won Kyu Lee, Sanq Geun Park, Dong Won Kang, Byoung Seong Jeong, Joonhoo Choi, Chi Woo Kim, Min Koo Han

Research output: Contribution to conferencePaperpeer-review

1 Scopus citations

Abstract

We designed and fabricated asymmetric-offset structure (AOS) top-gate n-type depletion mode polycrystalline silicon (poly-Si) thin film transistors (TFTs) which suppressed the leakage current considerably and have improved reliability significantly. The TFTs were fabricated on the glass substrates by employing alternating magnetic-field-enhanced rapid thermal annealing (AMFERTA) in order to improve the uniformity compared with widely used excimer laser annealing (ELA). The asymmetric-offset structure TFT can be made without additional doping processes or masks. These structures could greatly suppress the leakage current without sacrifice the ON current with increasing V DS and decreasing VGS. This device structure can be useful for achieving good image quality, high stability, and reducing the power consumption of active matrix organic light-emitting diode (AMOLED) panels.

Original languageEnglish
Pages663-666
Number of pages4
StatePublished - 2008
Event15th International Display Workshops, IDW '08 - Niigata, Japan
Duration: 3 Dec 20085 Dec 2008

Conference

Conference15th International Display Workshops, IDW '08
Country/TerritoryJapan
CityNiigata
Period3/12/085/12/08

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