Abstract
We designed and fabricated asymmetric-offset structure (AOS) top-gate n-type depletion mode polycrystalline silicon (poly-Si) thin film transistors (TFTs) which suppressed the leakage current considerably and have improved reliability significantly. The TFTs were fabricated on the glass substrates by employing alternating magnetic-field-enhanced rapid thermal annealing (AMFERTA) in order to improve the uniformity compared with widely used excimer laser annealing (ELA). The asymmetric-offset structure TFT can be made without additional doping processes or masks. These structures could greatly suppress the leakage current without sacrifice the ON current with increasing V DS and decreasing VGS. This device structure can be useful for achieving good image quality, high stability, and reducing the power consumption of active matrix organic light-emitting diode (AMOLED) panels.
Original language | English |
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Pages | 663-666 |
Number of pages | 4 |
State | Published - 2008 |
Event | 15th International Display Workshops, IDW '08 - Niigata, Japan Duration: 3 Dec 2008 → 5 Dec 2008 |
Conference
Conference | 15th International Display Workshops, IDW '08 |
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Country/Territory | Japan |
City | Niigata |
Period | 3/12/08 → 5/12/08 |