Abstract
Regular arrays of freestanding single carbon nanotubes (CNTs) were prepared on Ni dot arrays by dc plasma-enhanced chemical vapour deposition. The size of the Ni dot was reduced for single CNT growth by means of conventional photolithography and a lateral wet-etch process. The vertical alignment of a single CNT was directly dependent on the location of the catalyst metals. Using this method, well-separated and well-defined regular arrays of freestanding CNTs can be fabricated and the process can be scaled up at a lower cost than electron beam lithography, which is encouraging for applications in field emitters and nanoelectrodes.
| Original language | English |
|---|---|
| Pages (from-to) | 1269-1271 |
| Number of pages | 3 |
| Journal | Nanotechnology |
| Volume | 14 |
| Issue number | 12 |
| DOIs | |
| State | Published - Dec 2003 |
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