Thermal stability of ion-implanted hydrogen in ZnO

K. Ip, M. E. Overberg, Y. W. Heo, D. P. Norton, S. J. Pearton, S. O. Kucheyev, C. Jagadish, J. S. Williams, R. G. Wilson, J. M. Zavada

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Abstract

An investigation of thermodynamic stability of ion-implanted hydrogen in ZnO was presented. Secondary ion mass spectrometry was used for the analysis. Rutherford backscattering/channeling of samples implanted with 1H showed no change in backscattering yield near the ZnO surface. It was found by cathodoluminescence and photoluminescence studies that the intensity of the near gap emission from ZnO is reduced more than two orders of magnitude from the values in unimplanted samples.

Original languageEnglish
Pages (from-to)3996-3998
Number of pages3
JournalApplied Physics Letters
Volume81
Issue number21
DOIs
StatePublished - 18 Nov 2002

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