Thickness dependence of the crystallization of Ba-ferrite films

T. S. Cho; S. J. Doh; J. H. Je; D. Y. Noh

doi:10.1063/1.370993

Thickness dependence of the crystallization of Ba-ferrite films

T. S. Cho, S. J. Doh, J. H. Je, D. Y. Noh

Department of Nano & Advanced Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

38 Scopus citations

Abstract

Synchrotron X-ray scattering, field emission scanning electron microscope, and atomic force miscroscope are used to study the thickness dependence of the crystallization of magnetron sputtering grown Ba-ferrite thin films on sapphire(001) substrates. The saturation magnetization and the intrinsic coercivity behavior of the films are analyzed. Results showed that crystallization thickness dependence is attributed to the substrate effect.

Original language	English
Pages (from-to)	1958-1964
Number of pages	7
Journal	Journal of Applied Physics
Volume	86
Issue number	4
DOIs	https://doi.org/10.1063/1.370993
State	Published - 15 Aug 1999

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title = "Thickness dependence of the crystallization of Ba-ferrite films",

abstract = "Synchrotron X-ray scattering, field emission scanning electron microscope, and atomic force miscroscope are used to study the thickness dependence of the crystallization of magnetron sputtering grown Ba-ferrite thin films on sapphire(001) substrates. The saturation magnetization and the intrinsic coercivity behavior of the films are analyzed. Results showed that crystallization thickness dependence is attributed to the substrate effect.",

author = "Cho, {T. S.} and Doh, {S. J.} and Je, {J. H.} and Noh, {D. Y.}",

year = "1999",

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AU - Cho, T. S.

AU - Doh, S. J.

AU - Je, J. H.

AU - Noh, D. Y.

PY - 1999/8/15

Y1 - 1999/8/15

N2 - Synchrotron X-ray scattering, field emission scanning electron microscope, and atomic force miscroscope are used to study the thickness dependence of the crystallization of magnetron sputtering grown Ba-ferrite thin films on sapphire(001) substrates. The saturation magnetization and the intrinsic coercivity behavior of the films are analyzed. Results showed that crystallization thickness dependence is attributed to the substrate effect.

AB - Synchrotron X-ray scattering, field emission scanning electron microscope, and atomic force miscroscope are used to study the thickness dependence of the crystallization of magnetron sputtering grown Ba-ferrite thin films on sapphire(001) substrates. The saturation magnetization and the intrinsic coercivity behavior of the films are analyzed. Results showed that crystallization thickness dependence is attributed to the substrate effect.

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M3 - Article

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VL - 86

SP - 1958

EP - 1964

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 4

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Thickness dependence of the crystallization of Ba-ferrite films

Abstract

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