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Tunnel barrier engineering of titanium oxide for high non-linearity of selector-less resistive random access memory

  • Sangheon Lee
  • , Jiyong Woo
  • , Daeseok Lee
  • , Euijun Cha
  • , Jaesung Park
  • , Kibong Moon
  • , Jeonghwan Song
  • , Yunmo Koo
  • , Hyunsang Hwang

Research output: Contribution to journalArticlepeer-review

15 Scopus citations

Abstract

In this study, the effect of the oxygen profile and thickness of multiple-layers TiOx on tunnel barrier characteristics was investigated to achieve high non-linearity in low-resistance state current (ILRS). To form the tunnel barrier in multiple-layer of TiO x, tunnel barrier engineering in terms of the thickness and oxygen profile was attempted using deposition and thermal oxidation times. It modified the defect distribution of the tunnel barrier for effective suppression of ILRS at off-state (1/2VRead). By inserting modified tunnel barrier in resistive random access memory, a high non-linear ILRS was exhibited with a significantly lowered ILRS for 1/2V Read.

Original languageEnglish
Article number052108
JournalApplied Physics Letters
Volume104
Issue number5
DOIs
StatePublished - 3 Feb 2014

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