Ultrafast carrier relaxation and diffusion dynamics in ZnO

C. J. Cook, S. Khan, G. D. Sanders, X. Wang, D. H. Reitze, Y. D. Jho, Y. W. Heo, J. M. Erie, D. P. Norton, C. J. Stanton

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

12 Scopus citations

Abstract

We report on measurements and calculations of the ultrafast exciton relaxation dynamics in ZnO. Time-resolved differential reflectivity measurements of bulk ZnO were performed as a function of excitation wavelength. Bi-exponential decays of the A and B exciton states are observed with a fast (∼2-5 ps scale) and a slower (∼50-100 ps scale) component, which depend strongly on excitation wavelength. Theoretical calculations based on a multi-state, coupled rate equation model were directly compared with the experiments to account for the rapid scattering between the A and B valence bands. Results show that the inter-valence band scattering is most likely not responsible for the fast initial relaxation. Instead our results show that carrier diffusion can play an important role in explaining the initial fast relaxation.

Original languageEnglish
Title of host publicationOxide-based Materials and Devices
DOIs
StatePublished - 2010
EventOxide-based Materials and Devices - San Francisco, CA, United States
Duration: 24 Jan 201027 Jan 2010

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7603
ISSN (Print)0277-786X

Conference

ConferenceOxide-based Materials and Devices
Country/TerritoryUnited States
CitySan Francisco, CA
Period24/01/1027/01/10

Keywords

  • Carrier dynamics
  • Diffusion
  • Ultrafast differential reflectivity
  • Zinc oxide

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