Understanding of hydrogen silsesquioxane electron resist for sub- 5-nm-half-pitch lithography
- Joel K.W. Yang
- , Bryan Cord
- , Huigao Duan
- , Karl K. Berggren
- , Joseph Klingfus
- , Sung Wook Nam
- , Ki Bum Kim
- , Michael J. Rooks
- Massachusetts Institute of Technology
- Raith USA Inc.
- Seoul National University
- Yale University
Research output: Contribution to journal › Article › peer-review
170
Scopus
citations