Wafer bump inspection with transparent film layer using vertical scanning interferometer for semiconductor packaging

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

With micro-miniaturization and high density integration of semiconductor packages, wafer bump and substrate bump need to be in-line inspected in terms of volume, area and height. A vertical scanning interferometer is proposed for their shape inspection in three dimensions. For wafer bump under transparent film layer, specially-designed information extraction algorithms are suggested, which are composed of top surface and under-layer profile detection algorithm based on interferogram acquired with variations of vertical inspection head position. A series of experiments is performed for verification of the proposed inspection system, and acquired test results are discussed in detail.

Original languageEnglish
Title of host publication2008 International Conference on Control, Automation and Systems, ICCAS 2008
Pages513-516
Number of pages4
DOIs
StatePublished - 2008
Event2008 International Conference on Control, Automation and Systems, ICCAS 2008 - Seoul, Korea, Republic of
Duration: 14 Oct 200817 Oct 2008

Publication series

Name2008 International Conference on Control, Automation and Systems, ICCAS 2008

Conference

Conference2008 International Conference on Control, Automation and Systems, ICCAS 2008
Country/TerritoryKorea, Republic of
CitySeoul
Period14/10/0817/10/08

Keywords

  • 3D measurement
  • Semiconductor inspection
  • Vertical scanning interferometer
  • Wafer bump inspection

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