Wettability of nanoengineered dual-roughness surfaces fabricated by UV-assisted capillary force lithography

Hoon Eui Jeong, Moon Kyu Kwak, Chan Ick Park, Kahp Yang Suh

Research output: Contribution to journalArticlepeer-review

106 Scopus citations

Abstract

Micro- and nanoscale combined hierarchical polymer structures were fabricated by UV-assisted capillary force lithography. The method is based on the sequential application of engraved polymer molds with a UV-curable resin of polyurethane acrylate (PUA) followed by surface treatment with a trichloro(1H,1H,2H,2H-perfluorooctyl) silane in vapor phase. Two distinct wetting states were observed on these dual-roughness structures. One is "Cassie-Wenzel state" where a water droplet forms heterogeneous contact with microstructures and homogeneous contact with nanostructures. The other is "Cassie-Cassie state" where a droplet makes heterogeneous contact both with micro- and nanostructures. A simple thermodynamic model was developed to explain static contact angle, hysteresis, and wetting transition on dual-roughness structures.

Original languageEnglish
Pages (from-to)202-207
Number of pages6
JournalJournal of Colloid and Interface Science
Volume339
Issue number1
DOIs
StatePublished - 1 Nov 2009

Keywords

  • Dual roughness
  • Hierarchical structure
  • Lithography
  • Wettability

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